Transition from boundary – to bulk-controlled regimes in optical pattern formation

Year: 1993

Authors: Arecchi F.T., Boccaletti S., Ramazza P.L., Residori S.

Autors Affiliation: Istituto Nazionale di Ottica, Largo E. Fermi 6, 50125 Firenze, Italy;
Department of Physics, University of Firenze, 50125 Firenze, Italy

Abstract: By increasing the Fresnel number F of the cavity of a photorefractive oscillator, we report the transition from a boundary-controlled regime, where the size of the transverse patterns scales as 1/square-root F, to a bulk-controlled regime where the pattern size is independent of F. In this new regime, the size corresponds to an intrinsic correlation length imposed by diffusion processes within the material. The wave number spectrum of the emitted field has a sharp cutoff, corresponding to the length scale of bulk correlations. Such a new behavior is explained by the wave number dependence of the gain within the instability region.

Journal/Review: PHYSICAL REVIEW LETTERS

Volume: 70 (15)      Pages from: 2277  to: 2280

KeyWords: Fresnel number; pattern formation; Transition
DOI: 10.1103/PhysRevLett.70.2277

Citations: 79
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