Investigation on poling of Lithium Niobate patterned by interference lithography

Year: 2003

Authors: Grilli S., De Nicola S., Ferraro P., Finizio A., De Natale P., Pierattini G., Chiarini M.

Autors Affiliation: Istituto Nazionale di Ottica Applicata, Sez. di Napoli, c/o Istituto di Cibernetica “E. Caianiello” del CNR, Via Campi Flegrei 34, 80078 Pozzuoli (NA), Italy;
Istituto di Cibernetica “E. Caianiello” del CNR, Via Campi Flegrei 34, 80078 Pozzuoli (NA), Italy;
Istituto Nazionale di Ottica Applicata, Largo E. Fermi 6, 50125 Firenze, Italy;
Istituto per la Microelettronica e i Microsistemi (IMM) del CNR, Sez. di Napoli, Via Diocleziano 328, 80124, Napoli, Italy;
Istituto per la Microelettronica e i Microsistemi (IMM) del CNR, Sez. di Bologna, Via P. Gobetti 101, 40129 Bologna, Italy

Abstract: We realized one and two dimensional periodic ferroelectric domain structures obtained by an electric-field poling process applied to 500 μm thick Lithium Niobate crystal samples patterned by means of interference lithography. The fringe pattern is realized using a Michelson interferometric set-up and a He-Cd laser. We report on the appearance of high density and micrometer-sized single dot domains aligned along the direction of the interference fringes, as consequence of overpoling procedures. These structures are similar to those induced by back-switching. The effect seems to be originating by inverted domains” merging under the photoresist fringe pattern after spreading. We investigate the possibility to obtain a highly regular and homogeneous dot-structure which can find application for photonic crystals technology and nonlinear optics.

Journal/Review: PROCEEDINGS OF SPIE

Volume: 4944      Pages from: 126  to: 133

KeyWords: lithium niobate; interference lithography;

Citations: 1
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