Pattern stabilization through parameter alternation in a nonlinear optical system

Year: 2006

Authors: Sharpe J.P., Ramazza P.L., Sungar N., Saunders K.

Autors Affiliation: Calif Polytech State Univ San Luis Obispo, Dept Phys, San Luis Obispo, CA 93407 USA; Ist Nazl Ottica, I-50125 Florence, Italy

Abstract: We report the first experimental realization of pattern formation in a spatially extended nonlinear system when the system is alternated between two states, neither of which exhibits patterning. Dynamical equations modeling the system are used for both numerical simulations and a weakly nonlinear analysis of the patterned states. The simulations show excellent agreement with the experiment. The nonlinear analysis provides an explanation of the patterning under alternation and accurately predicts both the observed dependence of the patterning on the frequency of alternation and the measured spatial frequencies of the patterns.

Journal/Review: PHYSICAL REVIEW LETTERS

Volume: 96 (9)      Pages from: 94101-1  to: 94101-4

KeyWords: Feedback
DOI: 10.1103/PhysRevLett.96.094101

ImpactFactor: 7.072
Citations: 14
data from “WEB OF SCIENCE” (of Thomson Reuters) are update at: 2024-11-24
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