Quantum reflection of ultracold atoms from thin films, graphene and semiconductor heterostructures

Year: 2011

Authors: Judd T.E., Scott R.G., Martin A.M., Kaczmarek B., Fromhold T.M.

Autors Affiliation: Univ Tubingen, Inst Phys, CQ Ctr Collect Quantum Phenomena & Their Applicat, D-72076 Tubingen, Germany; Univ Trento, INO CNR BEC Ctr, I-38123 Povo, Italy; Univ Melbourne, Sch Phys, Parkville, Vic 3010, Australia; Univ Nottingham, Midlands Ultracold Atom Res Ctr, Nottingham NG7 2RD, England.

Abstract: We show that thin dielectric films can be used to enhance the performance of passive atomic mirrors by enabling quantum reflection probabilities of over 90% for atoms incident at velocities of similar to 1 mm s(-1), achieved in recent experiments. This enhancement is brought about by weakening the Casimir-Polder attraction between the atom and the surface, which induces the quantum reflection. We show that suspended graphene membranes also produce higher quantum reflection probabilities than bulk matter. Temporal changes in the electrical resistance of such membranes, produced as atoms stick to the surface, can be used to monitor the reflection process, non-invasively and in real time. The resistance change allows the reflection probability to be determined purely from electrical measurements without needing to image the reflected atom cloud optically. Finally, we show how perfect atom mirrors may be manufactured from semiconductor heterostructures, which employ an embedded two-dimensional electron gas to tailor the atom-surface interaction and so enhance the reflection by classical means.

Journal/Review: NEW JOURNAL OF PHYSICS

Volume: 13      Pages from: 83020-1  to: 83020-14

More Information: We gratefully acknowledge support from the Baden-Wurttemberg RiSC Programme, DFG through SFB/TRR21, EPSRC and BW-grid computing resources.
KeyWords: Transistors
DOI: 10.1088/1367-2630/13/8/083020

ImpactFactor: 4.177
Citations: 53
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